The kSA MOS UltraScan and kSA MOS ThermalScan systems are flexible, high-resolution scanning wafer curvature, bow, and tilt-measurement systems.
Key features
Thin Film Curvature and Stress
Absolute Reflectance
Wafer Bow, Tilt and Warp
Spectral Reflectance and Film Thickness Options
Full Wafer Maps
Based on proven and patented kSAMOS technology, the kSA MOS UltraScan uses a laser array to map the two-dimensional curvature, wafer bow, and stress of semiconductor wafers, optical mirrors, glass, lenses – practically any polished surface. For room temperature measurements, explore the kSA MOS UltraScan. If you want to know how your wafer changes with temperature, explore the kSA MOS ThermalScan.
MOS ThermalScan: Full Temperature-Dependent Mapping of Curvature, Film Stress, Tilt, and Bow Height.
MOS UltraScan: Flexible, High-Resolution Curvature, Stress, Thickness, and Reflectance Mapping, All in One Tool!Download ThermalScanhere.
Interesting Application note 1here.Interesting Application note 2here.Watch an interesting video Control Your Stress with kSA MOS Technology.Watch an interesting video kSA MOS UltraScan Full Sample Mapping of Curvature, Stress, Tilt, and Bow Height.Download brochure
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