kSA MOS
kSA Multi-beam Optical Sensor (kSA MOS) is an extremely sensitive laser based system for in situ, real-time monitoring of thin film stress.
Key features
- Measures Curvature
- Thin film stress-thickness
- Thin film stress
- Reflectivity
- Growth rate and optical constants (n, k) of semi-transparent films in real-time during the deposition process (Optional)
The stress measurement is performed by monitoring the substrate curvature with an array of parallel laser beams and a CCD detector. Since the technique is optically based, it is
compatible with most thin-film deposition processes, including
CVD/MOCVD, PVD, ALD, sputtering, electrochemical depositions, and MBE provided that optical access to the substrate is available. The system is
ideally suited for real-time feedback to process control systems in the production or research environment.
Understanding and controlling stress in thin-film and thermal annealing processes is critical for achieving the desired optical, electronic, and mechanical properties. Many of today’s high performance devices rely on or must be designed with “built-in” stress within the individual layers for tailoring specific characteristics. However, unwanted changes in thin-film stress can be introduced at any stage of the fabrication process and may lead to a reduction in device performance as well as delamination or cracking of deposited films.
Measure and provide feedback for curvature, stress, reflectivity and growth rate to improve production processes and increase profitability with the kSA MOS.
Interesting Application note: here.
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