Ideal for the cleaning, etching and passivating semiconductor substrates
The VUV source of choice for band structure analysis in XPS/UPS and ARPES systems, as well as for PEEM and Momentum Microscopy.
Class leading UHV mini e-beam evaporators for sub-monolayer to multilayer growth
Ion sources for Sample Prep, Depth Profiling and XPS “dual-beam” charge neutralisation.
Used in analysis of 2D materials, spintronics and nanomagnetic devices and may be integrated into any ARPES analyser.
The PEEM plus its modular upgrades can be operated standalone or as the input lens of a Momentum Microscope.