Based on the design concept of the EFM 3 evaporators, the triple evaporator EFM 3T features three independent cells for the evaporation of a wide range of materials from wires, rods or crucibles.
The three individual cells have crossing beams at about 93 mm distance from the exit aperture (254mm from the mounting flange) to ensure a maximum overlap of the evaporation area. Each cell is equipped with a separate filament and HV supply to prevent crosstalk. Three independent flux monitors enable the controlled stoichiometric growth of compounds.
The EFM 3T is also available with ion suppression (EFM 3Ts)
- Evaporation area Ø 8.5, 11 and 15 mm
- Working distance 93 mm (± 10 mm)
- 3 independent cells/filaments/ flux monitors
- No crosstalk during compound growth
- Integrated multi-position shutter and Flux Monitors
- Fully Bakeable to 250°C
- Mounting flange NW35CF
All other features same as EFM 3
The integral multi-position shutter enables precise dosing and simultaneous or consecutive evaporation to produce e.g. super lattices or multilayers. The latter is easily accomplished by means of the optional shutter motorization and the PC software tool Multi Epitass®.
The deposition area is governed by the choice of one of three apertures. The three evaporation targets are independently mounted on three 25 mm Z-shifts for alignment. This feature allows evaporation from rods with a multi-pocket instrument. The target materials can be easily refilled from the rear (3x NW 16 CF).
One power supply can operate all three cells sequentially. In case of co-evaporation each material requires a separate power supply.