The FDG 15 ion source is designed to clean samples for surface analysis, to perform simple depth profiling, as an excitation source for ISS/LEIS experiments and to provide low energy ions (< 15 eV) for Dual-Beam XPS charge neutralization.
The extremely clean ion beam is delivered by a non line of sight filament, a gas injection into the ionization cage and effective differential pumping. The ionization is via electron bombardment to provide a continuous variable beam current from the nA to μA regime. A dedicated ion focusing optics allows a focussed spot size down to 300 μm for sputtering of small crystals and to adapt for larger working distances up to 300 mm.
- Variable spot size
- 400 eV to 5 KeV (15eV option)
- Non line-of-sight filament
- 30 mm – 300 mm working distance
- Differentially pumped
- Integrated port aligner
- Mounting Flange: NW35CF
The FDG 15 can be fully controlled by the front electronics panel, TCP/IP interface or LabVIEW™ control software and a range of upgrade options are available.
For dedicated depth profiling, with a small spot we recommend the FDG 150