IG2 Ion Source
The IG2 sputter ion package is the perfect solution for low cost ion beam etching and sputter cleaning of specimens for surface analysis, cleaning STM tips, general vacuum science and nano technology applications. If you just want to clean the surface of your sample or STM tip this simple to operate and reliable sputter ion source and controller is the perfect solution. The IG2 can also operate with inert gases such as Argon as well as Oxygen.
Key features
- Low cost
- Easy to use
- Long Filament Lifetime
- Source Type: Hot filament electron impact (dual filament, backfill type) Beam Energy ≤ 2 keV in 500 eV increments
- Beam Energy: ≤ 2 keV in 500 eV increments
- Beam Diameter: at 25 mm working distance - 2.5 mm FWHM (at target)
- Beam Diameter: at 50 mm working distance - 3.5 mm FWHM (at target)