PEEM
The FOCUS PEEM utilizes the technique of photoemission electron microscopy to image electrons emitted from any flat and conducting sample surface. Electron emission from surfaces can be caused by UV, VUV or x-ray photons, by thermal activation, by electron/ion bombardment or even by field emission. The PEEM can be combined with the dedicated high stability integrated sample stage (IS) and various available energy filters for specialist research applications. The objective lens is designed as an electrostatic immersion lens to collect electrons from 0.0 eV up to 1.6 keV (HAXPEEM: up to 10 keV).
Key features
- Workfuction Mapping
- Microscopic ARPES (µ-ARPES)
- Lateral Resolution: <35nm (IS-PEEM)
- Field of View: 3 µm-> 800
- Extraction Voltage: 50V -> 16 kV